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ion-implant doping

См. также в других словарях:

  • Ion implantation — is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as… …   Wikipedia

  • Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… …   Wikipedia

  • Memristor — Type Passive Working principle Memristance Invented Leon Chua (1971) First production HP Labs (2008) Electronic symbol …   Wikipedia

  • High-temperature superconductivity — Unsolved problems in physics What causes superconductivity at temperatures above 50 kelvin? High temperature superconductors (abbreviated high Tc or HTS) are materials that have a superconducting transition temperature (Tc) above 30 K… …   Wikipedia

  • Silvaco — Infobox Company company name = Silvaco International company company type = Private Company| foundation = 1984 location = key people = Dr Ivan Pesic, President/CEO industry = Software Programming homepage = [http://www.silvaco.com/… …   Wikipedia

  • Quantum dot — Part of a series of articles on Nanomaterials Fullerenes …   Wikipedia

  • Charge-coupled device — A specially developed CCD used for ultraviolet imaging in a wire bonded package. A charge coupled device (CCD) is a device for the movement of electrical charge, usually from within the device to an area where the charge can be manipulated, for… …   Wikipedia

  • Integrated circuit — Silicon chip redirects here. For the electronics magazine, see Silicon Chip. Integrated circuit from an EPROM memory microchip showing the memory blocks, the supporting circuitry and the fine silver wires which connect the integrated circuit die… …   Wikipedia

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